Using a GaN nanorod template in a hydride vapor
phase epitaxy (HVPE) system can manufacture a freestanding GaN (FS-GaN) substrate with
threading dislocation densities down to ~ 107 cm-2. In this letter, we
report InGaN/GaN multiple-quantum-well light-emitting diodes (LEDs) grown
on this FS-GaNsubstrate. The defect densities in the homoepitaxially grown LEDs
were substantially reduced, leading to improved light emission efficiency.
Compared with the LED grown on sapphire, we obtained a lower forward voltage,
smaller diode ideality factor, and higher light-output power in the same
structure grown on FS-GaN. The external quantum efficiency (EQE) of LEDs grown
on FS-GaN were improved especially at high injection current, which brought
the efficiency droop phenomenon greatly reduced at high current density.
Source:IEEE
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