InGaN-based
blue light-emitting diodes (LEDs) with different quantum well (QW) thicknesses
were grown on freestanding GaN substrates with low threading
dislocation densities (TDDs) and on c-plane sapphire substrates. In
the case of thin QWs of 3 nm in thickness, the external quantum
efficiencies (EQEs) of LEDs on GaN substrates, as well as those on
sapphire substrates, decreased with increasing forward current, indicating
that carrier localization is in play on both types of substrates. For
thicker 5-nm-thick QWs, the EQEs of LEDs grown on GaN substrates improved
at high current densities, while those on sapphire substrates decreased
even at low current densities. The LED with 5-nm-thick QWs on the GaN substrate mounted p-side
down and molded with epoxy showed EQE as high as 26% at 125 A/cm2.
Cathodoluminescence observations of the active layers on GaN substrates revealed
that the expansion of nonradiative areas related to TDDs, which are responsible
for the deterioration of the EQE of the LED on the sapphire substrate, had
been suppressed.
Source:IEEE
If
you need more information about Improvements of external quantum efficiency of
InGaN-based blue light-emitting diodes at high current density using GaN
substrates, please visit:http://www.qualitymaterial.net or send us email
at gan@powerwaywafer.com.
No comments:
Post a Comment